Facilities - equipment listing
Recipes
Recipes listed below have been tested by IMSE staff at some point in past. These are not guaranteed to work. Please use these as a starting point in developing your recipe.
MJB Mask Aligner (3" diameter)
AZP4620 resist process
SU8-2050 resist process
S1805 resist process
Laser Writer
AZ 1500 resist process
AZP4620 resist process
KL IR 15 resist process
S1805 resist process
AutoCAD Guidelines
Mask Preparation
AutoCAD alignment template
AutoCAD alignment template for Mask based Alignment
Guidelines for FS/BS alignment marks
GrayScale Template
ICP/RIE
Bosch Si etch performance
Si etch (continuous etch)Â performance
SiO2 etch performance
SiN etch performance
Repeatability tests
Resist etch rate (O2 plasma)
Nanofab/PECVD
SiO2 deposition
SiN deposition
Poly-Si deposition
Sputtering Deposition
Aluminum deposition
Cr deposition
Cu deposition
Nb deposition
SiO2 deposition
ZnO deposition
Thermal Evaporator Deposition
Tube Furnace
Wet Etching
Miscellaneous
Lift-off process with KLIR 15 Resist
Lift-off process with LOR10B/S1805 Resist
PDMS Process